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Silicon

Si
Deposition: PVD — Sputter & Evaporator
Category: Semiconductor
Formula: Si

Silicon (Si) films by RF magnetron sputtering (Si (100)). A 250 nm film shows n = 4.595 @ 587 nm (3.727 @ 1525 nm) — amorphous silicon layers for optics, sensors and device research. Targets: 99.9 %, 2–3 in.

Specifications

Thin-Film Specifications

Silicon characterization data 1
Silicon characterization data 2
Silicon characterization data 3
  • Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
  • Substrate : Si (100)
  • Thickness : 250 nm
  • Refractive Index (n) : 4.594714 (@ 587 nm) / 3.727408 (@ 1525 nm)
  • Extinction Coefficient (k) : 0.596195 (@ 587 nm) / 0.000000 (@ 1525 nm)

Target Specifications

  • Target Material : Silicon (Si)
  • Purity : 99.9%
  • Diameter : 2”, 3”
Silicon sputtering target Target
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