Tin Dioxide
SnO₂Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: SnO₂
Tin dioxide (SnO₂) films by RF magnetron sputtering. A 141 nm film shows n = 1.999 @ 587 nm — a stable wide-bandgap oxide for gas sensors and transparent conductive layers. Targets: 99.5 %, 3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 141 nm
- Refractive Index (n) : 1.998737 (@ 587 nm)
- Extinction Coefficient (k) : 0.03812 (@ 587 nm)
Target Specifications
- Target Material : Tin Dioxide
- Purity : 99.5%
- Diameter : 3”
Target