Silicon Dioxide
SiO₂Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: SiO₂
Silicon dioxide (SiO₂) films by RF magnetron sputtering. A 107.6 nm amorphous film shows RMS roughness of 1.238 nm and n = 1.457 @ 587 nm — the universal low-index dielectric for insulation and optical multilayers. Targets: 99.9 %, 2–3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 107.6 nm
- Film Crystallinity : Broad amorphous peak
- RMS Roughness : 1.238 nm
- Refractive Index (n) : 1.4567 (@ 587 nm)
- Extinction Coefficient (k) : 0.000000 (@ 587 nm)
Target Specifications
- Target Material : Silicon Dioxide (SiO2)
- Purity : 99.9%
- Diameter : 2”, 3”
Target