Nickel Oxide
NiODeposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: NiO
Nickel oxide (NiO) p-type oxide films by RF magnetron sputtering (Si (100)). A 50 nm film shows n = 2.118 @ 587 nm with zero extinction — used for hole-transport layers, electrochromics and resistive switching. Targets: 99.99 %, 3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 50 nm
- Refractive Index (n) : 2.118204 (@ 587 nm)
- Extinction Coefficient (k) : 0.000000 (@ 587 nm)
Target Specifications
- Target Material : Nickel Oxide
- Purity : 99.99%
- Diameter : 3”
Target