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Tungsten

W
Deposition: PVD — Sputter & Evaporator
Category: Metal
Formula: W

Tungsten (W) thin films deposited by sputtering and evaporation — used for refractory contacts and X-ray optics. Targets: 99.95 %, 2 in.

Specifications

Thin-Film Specifications

Tungsten characterization data 1
Tungsten characterization data 2

Target Specifications

  • Target Material : Tungsten (W)
  • Purity : 99.95%
  • Diameter : 2”
Tungsten sputtering target Target
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