VANAM — VANA Materials LAB. VANAM — VANA Materials LAB.
EN / KO
← Back to Technology

Hafnium

Hf
Deposition: PVD — Sputter & Evaporator
Category: Metal
Formula: Hf

Hafnium (Hf) thin films deposited by sputtering and evaporation — used for gate-stack and nitride precursor layers. Targets: 99.95 %, 2 in.

Specifications

Thin-Film Specifications

Hafnium characterization data 1
Hafnium characterization data 2

Target Specifications

  • Target Material : Hafnium (Hf)
  • Purity : 99.95%
  • Diameter : 2”
Hafnium sputtering target Target
Request a quote for this material →