Titanium
TiDeposition: PVD — Sputter & Evaporator
Category: Metal
Formula: Ti
Titanium (Ti) thin films deposited by sputtering and evaporation — used for adhesion and barrier layers. Targets: 99.99 %, 2–3 in.
Specifications
Thin-Film Specifications
Target Specifications
- Target Material : Titanium (Ti)
- Purity : 99.99%
- Diameter : 2”, 3”
Target