Silicon Nitride
SiNₓDeposition: PVD — Sputter & Evaporator
Category: Nitride
Formula: SiNₓ
Silicon nitride (SiNₓ) films by RF magnetron sputtering. A 37 nm film shows n = 2.012 @ 587 nm (2.061 @ 1525 nm) with near-zero extinction — a passivation and photonic-waveguide staple. Targets: 99.99 %, 3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 37.035 nm
- Refractive Index (n) : 2.011712 (@ 587 nm) / 2.061467 (@ 1525 nm)
- Extinction Coefficient (k) : 0.000066 (@ 587 nm) / 0.000000 (@ 1525 nm)
Target Specifications
- Target Material : Silicon Nitride
- Purity : 99.99%
- Diameter : 3”
Target