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Titanium Nitride

TiN
Deposition: PVD — Sputter & Evaporator
Category: Nitride
Formula: TiN

Titanium nitride (TiN) films by RF magnetron sputtering — a conductive, diffusion-barrier nitride for electrodes, hard coatings and plasmonics. Targets: 99.99 %, 2 in.

Specifications

Thin-Film Specifications

Titanium Nitride characterization data 1

Target Specifications

  • Target Material : Titanium Nitride (TiN)
  • Purity : 99.99%
  • Diameter : 2”
Titanium Nitride sputtering target Target
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