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Zinc Oxide

ZnO
Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: ZnO

Zinc oxide (ZnO) thin films by RF magnetron sputtering. An 85 nm film shows n = 1.986 @ 587 nm — a versatile wide-bandgap oxide for transparent electronics, piezoelectric layers and UV optoelectronics. Targets: 99.99 %, 2–3 in.

Specifications

Thin-Film Specifications

Zinc Oxide characterization data 1
Zinc Oxide characterization data 2
Zinc Oxide characterization data 3
  • Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
  • Substrate : Si (100)
  • Thickness : 85 nm
  • Refractive Index (n) : 1.985522 (@ 587 nm)
  • Extinction Coefficient (k) : 0.000003 (@ 587 nm)

Target Specifications

  • Target Material : Zinc Oxide
  • Purity : 99.99%
  • Diameter : 2”, 3”
Zinc Oxide sputtering target Target
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