Hafnium Oxide
HfO₂Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: HfO₂
Hafnium oxide (HfO₂) thin films by RF magnetron sputtering (vacuum < 1.0 × 10⁻⁶ Torr, Si (100)). A 345.3 nm film shows n = 2.020 @ 587 nm with zero extinction — a high-k dielectric and optical coating staple. Targets: 99.9 %, 2–3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 345.3 nm
- Refractive Index (n) : 2.020440 (@ 587 nm)
- Extinction Coefficient (k) : 0.000000 (@ 587 nm)
Target Specifications
- Target Material : Hafnium Oxide
- Purity : 99.9%
- Diameter : 2”, 3”
Target