Tantalum Pentoxide
Ta₂O₅Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: Ta₂O₅
Tantalum pentoxide (Ta₂O₅) low-loss optical films by RF magnetron sputtering. A 132.4 nm amorphous film shows RMS roughness of just 0.291 nm and n = 2.137 @ 587 nm with zero extinction into the IR — the waveguide material of choice for photonic integrated circuits. Targets: 99.95 %, 3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 132.4 nm
- Film Crystallinity : Broad amorphous peak
- RMS Roughness : 0.291 nm
- Refractive Index (n) : 2.1367 (@ 587 nm) / 2.067869 (@ 1525 nm)
- Extinction Coefficient (k) : 0.000000 (@ 587 nm) / 0.000000 (@ 1525 nm)
Target Specifications
- Material : Tantalum Pentoxide (Ta2O5)
- Purity : 99.95%
- Diameter : 3”
Target