Titanium Dioxide
TiO₂Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: TiO₂
Titanium dioxide (TiO₂) optical thin films by RF magnetron sputtering (vacuum < 1.0 × 10⁻⁶ Torr, Si (100)). A 150 nm film shows a high refractive index of 2.534 @ 587 nm (2.422 @ 1525 nm) with zero extinction — suited to optical coatings, photocatalysis and high-k stacks. Targets: 99.99 %, 3 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 150 nm
- Refractive Index (n) : 2.534084 (@ 587 nm) / 2.422304 (@ 1525 nm)
- Extinction Coefficient (k) : 0.000000 (@ 587 nm) / 0.000000 (@ 1525 nm)
Target Specifications
- Target Material : Titanium Dioxide
- Purity : 99.99%
- Diameter : 3”
Target