Vanadium Dioxide
VO₂Deposition: PVD — Sputter & Evaporator
Category: Oxide
Formula: VO₂
Vanadium dioxide (VO₂) thermochromic thin films — VanaM's signature material — deposited by RF magnetron sputtering below 1.0 × 10⁻⁶ Torr. Films on Si (100) show (-402)-oriented polycrystallinity with a resistance ON/OFF ratio above 10⁴ and an insulator–metal transition below 60 °C, enabling smart windows, IR modulation and thermal switching. Sputtering targets: 99.99 % purity, 4 in.
Specifications
Thin-Film Specifications
- Film-coated by RF magnetron sputtering vacuum < 1.0 × 10⁻⁶ Torr
- Substrate : Si (100)
- Thickness : 150 nm
- Film Crystallinity : (-402) oriented polycrystals
- RMS Roughness : 6.917 nm
- Resistance ON/OFF ratio : > 1.0 × 10⁴
- Transition temperature : < 60 °C
Target Specifications
- Target Material : Vanadium Dioxide (VO2)
- Purity : 99.99%
- Diameter : 4”
Target