| Bulk Type | vs | Thin Film Type |
| cm or mm | Unit size | nm (<1/10000) |
| 15 steps | Process step | 4 steps |
| ~ 1 month | Process time(1set) | ~ 6 hours |
| ⬆ | Production cost | ⬇ |
| O (Toluene, Benzene) |
Toxic materials | X |
Core Technologies
Next-generation Thin Film
From bulk semiconductor components to thin film & SoC integration via eco-friendly process
Eco-friendly
deposition process
deposition process
Thin film type
components
components
Integration from
bulk to one chip
bulk to one chip
World 1st Multifunctional Energy Responsive Thin Film
Foundry & Service
World 1st Energy-Responsive Semiconductor
Sensing + Switching function to Thermal or Electrical energy
Applications: Safety system, Thermal management system
Fabrication Process
Competitive Price
Simplified eco-friendly process, reduced steps + time + raw material
Function & Performance
Increased accuracy through system simplification
Passive & active components in a single thin film
Conventional System
Numerous complex components
Ultra Simplified System
Multi-functional semiconductor
“Next Generation Thin Film on Emerging Technology”
High-crystalline thin film deposition source technology
Applicable in various fields such as quantum computing, AI semiconductor & power electronics.
PoC in progress with R&D partners
PoC and joint development with companies and research institutes in various fields such as semiconductor, display, and electronic component companies.
Quantum Computing
Quantum Key Distribution, Phase Shifter
A.I. Semiconductors
Neuromorphic, Analog Switch
Power Electronics
High Power, RF device
Glass Substrate
Highly-crystalline thin film & Metal
Advanced Materials
Display, Sensor, Piezo & Ferroelectric
Research & Testbed
Thin Film Total Solution
Customized Thin Film Deposition Service
Specialized thin film deposition services in various fields according
to customer needs.
to customer needs.
Development of special thin films & deposition process conditions
unavailable in conventional fabs.
PVD–Sputter & Evaporator
High Crystallization Thin Films
Oxide VO2, V2O5, TiO2, Ta2O5, HfO2, ZnO, ITO, IGZO, …
Nitride TiN, AlN, AlScN, SiNx, …
Metal Au, Pt, Ag, Al, Ti, Cr, Ni, Bi, Mo, Hf, Sc, W
ALD
Sub Nano Scale Thin films
Oxide Al2O3, HfO2, ZrO2, HZO, ZnO, TiO2, In2O3,
Ga2O3, SnO2, SnO, …
Metal Pt, Ru
Deposition Process
• The deposition process is based on customer request (material, substrate, process conditions, pre-/post-processes, etc.). After an expert team reviews the request, a quotation is prod
• The deposited thin film is shipped after a basic quality inspection. Additional physical and chemical analysis as well as device production are possible upon request.
Innovative R&D Service for Thin Film
Research & Testbed
A.I. development of prediction model
Thin film process big data collection system establishment. AI development of thin film process optimization and performance prediction model.
Vanam deposits special thin films following
customer request. It also collects and analyzes
data generated during the process to predict
the thin film’s characteristics, dramatically
reducing time and cost
customer request. It also collects and analyzes
data generated during the process to predict
the thin film’s characteristics, dramatically
reducing time and cost
• Customized special thin film materials & devices
• Desired thin film properties + optimized process
• Device design and Fab-linked device manufacturing service
• Desired thin film properties + optimized process
• Device design and Fab-linked device manufacturing service
Our expert team provides various
customer-specific thin film & device analyses,
from non-destructive spectroscopy
to electrical analysis
customer-specific thin film & device analyses,
from non-destructive spectroscopy
to electrical analysis
• Thin film material analysis
SEM, TEM, XRD, XPS, UPS, AFM, Raman
• Device characteristic analysis
I-V, C-V, Pulse measurement, Ferro., Piezo.
SEM, TEM, XRD, XPS, UPS, AFM, Raman
• Device characteristic analysis
I-V, C-V, Pulse measurement, Ferro., Piezo.
We offer growth kinetics simulation for
new material thin film development
new material thin film development
• DFT-based adsorption thermodynamics & growth mechanism
• Chemical energy potential calculations for thermodynamics and area selectivity
• Physical variables such as crystal orientation, morphology, and strain
• Chemical energy potential calculations for thermodynamics and area selectivity
• Physical variables such as crystal orientation, morphology, and strain
IP Solution
Research Team
• Thin film materials and process technology analysis
• Thin film simulation
• Commercial viability test
Patent Team
• Core IP analysis based on technology verification
• IP portfolio construction
• Technology transfer mediation
Equipment & Infra solution
• Small urban factory with cleanroom facilities
Deposition equipment developed
with a team of vacuum equipment
manufacturing experts with over
30 years of experience
with a team of vacuum equipment
manufacturing experts with over
30 years of experience
VanaM provides process technology and deposition solutions that go beyond simple manufacturing, thereby minimizing the cost and time incurred in the early R&D stages. We have developed special deposition instruments equipped with an additional system that can secure process data such as plasma wavelength and residual gas, enabling thin film performance prediction and process optimization through machine learning.
Sputter
PLD
Evaporator
ALD & MOCVD
Process Big Data Collection System
Sputter
PLD
Evaporator
ALD & MOCVD